ngwaahịa

Ngwa SiC

nkowa nkenke:

Nnukwu ire ụtọ
2.High lattice matching (MCT)
3.Low dislocation njupụta
4.High infrared transmittance


Nkọwa ngwaahịa

Mkpado ngwaahịa

Nkọwa

Silicon carbide (SiC) bụ ọnụọgụ ọnụọgụ abụọ nke Group IV-IV, ọ bụ naanị ogige siri ike siri ike na Group IV nke tebụl oge, Ọ bụ semiconductor dị mkpa.SiC nwere ezigbo thermal, igwe, kemịkalụ na eletriki, nke na-eme ka ọ bụrụ otu n'ime ihe kachasị mma maka imepụta ngwa elektrọnik dị elu, ugboro ugboro na ike dị elu, SiC nwekwara ike iji dị ka ihe mkpụrụ. maka diode ọkụ na-acha anụnụ anụnụ dabere na GaN.Ka ọ dị ugbu a, 4H-SiC bụ ngwaahịa kachasị na ahịa, a na-ekewa ụdị conductivity n'ime ụdị mkpuchi nke ọkara na ụdị N.

Njirimara

Ihe

2 inch 4H N-ụdị

Dayameta

2 anụ ọhịa (50.8mm)

Ọkpụrụkpụ

350+/-25um

Nhazi

gbanyụọ axis 4.0˚ n'ebe <1120> ± 0.5˚

Nhazi Flat nke izizi

<1-100> ± 5°

Ụlọ elu nke abụọ
Nhazi

90.0˚ CW sitere na Primary Flat ± 5.0˚, Si ihu elu

Ogologo Flat nke izizi

16 ± 2.0

Ogologo Flat nke abụọ

8 ± 2.0

Ọkwa

Ọkwa mmepụta (P)

Ọkwa nyocha (R)

Ngụsị akwụkwọ (D)

Nguzogide

0.015 ~ 0.028 Ω·cm

<0.1 Ω·cm

<0.1 Ω·cm

Njupụta Micropipe

≤ 1 micropipe / cm²

≤ 1 0 micropipes/cm²

≤ 30 micropipe / cm²

Ọdịdị dị n'elu

Na ihu CMP Ra <0.5nm, C Face Ra <1 nm

N/A, mpaghara eji eme ihe> 75%

TTV

<8 nke

<10um

<15 nke

Ụta

< 8 um

< 10um

< 15um

Warp

<15 nke

<20 um

<25 nke

Mgbawa

Ọ dịghị

Ogologo ngụkọta ≤ 3 mm
na nsọtụ

Mgbakọ ogologo ≤10mm,
otu
ogologo ≤ 2mm

Ọkpụkpụ

≤ 3 nkọcha, mkpokọta
ogologo <1* dayameta

≤ 5 ncha, nchikota
ogologo <2* dayameta

≤ 10 nkọcha, mkpokọta
ogologo <5* dayameta

Efere Hex

kacha 6 efere,
<100um

kacha 12 efere,
<300um

N/A, mpaghara eji eme ihe> 75%

Mpaghara Polytype

Ọ dịghị

Mpaghara mkpokọta ≤ 5%

Mpaghara mkpokọta ≤ 10%

Mmetọ

Ọ dịghị

 


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